Analysis of thin high-k and silicide films by means of heavy ion time-of-flight forward-scattering spectrometry-Reference-Cited by-同舟云学术

Analysis of thin high-k and silicide films by means of heavy ion time-of-flight forward-scattering spectrometry

Published:2006-08 Issue:1-2 Volume:249 Page:292-296
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Sajavaara T.,Brijs B.,Giangrandi S.,Arstila K.,Vantomme A.,Vandervorst W.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference13 articles.

5. T. Sajavaara, B. Brijs, S. Giangrandi, W. Vandervorst, A. Vantomme, in preparation.

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