Author:
Mistry P.,Gomez-Morilla I.,Grime G.W.,Webb R.P.,Gwilliam R.,Cansell A.,Merchant M.,Kirkby K.J.,Teo E.J.,Breese M.B.H.,Bettiol A.A.,Blackwood D.J.,Watt F.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference16 articles.
1. H.F. Ted Fedynyshyn, J. Willem Gemmink, I. Hanyu, N. Hayashi, S. Hector, International Technology Roadmap for Semiconductors – Lithography. Semiconductor Industry Association, 2003.
2. The new Surrey ion beam analysis facility;Simon;Nucl. Instr. and Meth. B,2004
3. Three-dimensional micromachining of silicon using a nuclear microprobe;Teo;Nucl. Instr. and Meth. B,2004
4. The National University of Singapore high energy ion nano-probe facility: performance test;Watt;Nucl. Instr. and Meth. B,2003
5. Three-dimensional nanolithography using proton beam writing;van Kan;Appl. Phys. Lett.,2003
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