SIMS depth profile study using metal cluster complex ion bombardment-Reference-Cited by-同舟云学术

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SIMS depth profile study using metal cluster complex ion bombardment

Published:2007-05 Issue:1 Volume:258 Page:242-245
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Tomita M.,Kinno T.,Koike M.,Tanaka H.,Takeno S.,Fujiwara Y.,Kondou K.,Teranishi Y.,Nonaka H.,Fujimoto T.,Kurokawa A.,Ichimura S.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference9 articles.

1. Optimized time-of-flight secondary ion mass spectroscopy depth profiling with a dual beam technique

2. Use of an SF[sub 5][sup +] polyatomic primary ion beam for ultrashallow depth profiling on an ion microscope secondary ion mass spectroscopy instrument

3. Depth profiling using C60+ SIMS—Deposition and topography development during bombardment of silicon

4. Development of compact cluster ion sources using metal cluster complexes

5. Production of Stable Ion Beam of Os3(CO)12with Compact Metal-Cluster-Complex Ion Source

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface Analysis of Organic Materials with Polyatomic Primary Ion Sources;Cluster Secondary Ion Mass Spectrometry;2013-04-15

2. Characteristics of a Metal-Cluster-Complex Ion Beam and Its Application to Secondary Ion Mass Spectrometry (SIMS);Hyomen Kagaku;2010

3. Ion Beam Generation from an Electrolyte Solution Containing Polyatomic Cations and Anions for Secondary Ion Mass Spectrometry;Japanese Journal of Applied Physics;2009-12-21

4. Metal cluster complex primary ion beam source for secondary ion mass spectrometry (SIMS);Vacuum;2009-12

5. Production and Applications of Metal-cluster-complex Ion Beams;Journal of the Vacuum Society of Japan;2009

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