Integration Processes for nPERT Si Solar Cells Using Single Side Emitter Epitaxy and front Side Laser Doping

Author:

Kuzma-Filipek Izabela,Recaman-Payo Maria,Li Yuandong,Hajjiah Ali,Duerinckx Filip,Cornagliotti Emanuele,Castro Angel Uruena De,Sharma Aashish,Borgers Tom,Russell Richard,Tous Loic,John Joachim,Haslinger Michael,Aleman Monica,Szlufcik Jozef

Publisher

Elsevier BV

Reference10 articles.

1. “Selective epitaxial growth of silicon and some potential applications”, IBM Journal of Research and Development, Thin layer formation;Ginsberg,1990

2. M. Recamán Payo, et al. “Boron-doped selective silicon epitaxy: high efficiency and process simplification in IBC cells”, WO 2013/020868.

3. M. Recamán Payo, et al. “Opportunities for silicon epitaxy in bulk crystalline silicon photovoltaics”, EUPVSEC Amsterdam 2014.

4. A. Hurle et al., Proceedings of 19th European Photovoltaic Solar Energy Conference and Exhibition, Paris, 2004, pp. 459-462

5. http ://www.nanalyze.com/2014/07/solexel-grows-cheap-solar-cells-using-silicon-gas/.

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