Design and control of a piezoelectric driven reticle assist device for prevention of reticle slip in lithography systems-Reference-Cited by-同舟云学术

Design and control of a piezoelectric driven reticle assist device for prevention of reticle slip in lithography systems

Published:2014-09 Issue:6 Volume:24 Page:562-571
ISSN:0957-4158
Container-title:Mechatronics
language:en
Short-container-title:Mechatronics

Author:

Amin-Shahidi Darya,Trumper David L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Computer Science Applications,Mechanical Engineering,Control and Systems Engineering

Reference26 articles.

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3. Shibazaki Y. Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method. US Patent 8,253,929 [28.08.2012].

4. Baggen MK, Bijvoet D-J, Donders SNL, Hoogkamp JF, Jansen AJM, Kuit J-J, et al. Stage apparatus, lithographic apparatus and device manufacturing method. US Patent 7,459,701 [02.12.2008].

5. Zordan E. Reticle clamping system. US Patent App. 13/168,109 [24.06.2011].

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