Effect of deposition parameters on the formation of cubic BN films deposited by plasma-assisted chemical vapour deposition from non-toxic material
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference37 articles.
1. Plasma deposition of cubic boron nitride films from non-toxic material at low temperatures
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4. Ion Assisted Synthesis of Boron Nitride Coatings
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1. Synthesis of cubic boron nitride film by inductively coupled plasma CVD technique;Journal of Physics D: Applied Physics;2003-12-19
2. Boron nitride films synthesized by RF plasma CVD of borane–ammonia and nitrogen;Materials Chemistry and Physics;2002-08
3. Review of advances in cubic boron nitride film synthesis;Materials Science and Engineering: R: Reports;1997-12
4. Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-07
5. Macro and Micro Structural Factors in Thin Film Growth of III-V Compounds;Wide Band Gap Electronic Materials;1995
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