Author:
Nishimura Yoshimi,Chayahara Akiyoshi,Horino Yuji,Yatsuzuka Mitsuyasu
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference4 articles.
1. Repetitively pulsed metal ion beams for ion implantation
2. Plasma source ion‐implantation technique for surface modification of materials
3. Ion-plasma surface modification technologies at ONRI, Proc. IEEJ Workshop on Plasma, Kyoto, PST-00-64;Horino,2000
4. RF (13.56 MHz) superposed HV pulse PBII and deposition, Proc. Plasma Sci. Sym., Kyoto;Nishimura,2001
Cited by
44 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献