Effect of electron and proton irradiation on recombination centers in GaAsN grown by chemical beam epitaxy
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Materials Science
Reference36 articles.
1. Projected performance of three- and Four-junction devices using GaAs and GaInP;Kurtz,1997
2. 1-eV solar cells with GaInNAs active layer;Friedman;J. Crys. Growth,1988
3. Near-field magneto-photoluminescence spectroscopy of composition fluctuations in InGaAsN;Mintairov;Phys. Rev. Lett.,2001
4. Properties of chemical beam epitaxy grown GaAs0.995N0.005 homo-junction solar cell;Bouzazi;Curr. Appl. Phys.,2010
5. Nanoscale analysis of the In and N spatial redistributions upon annealing of GaInNAs quantum wells;Chauveau;Appl. Phys. Lett.,2004
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Role of defects in tailoring the structural, electrical and optical properties of Schottky diodes based on GaAsBi alloy through gamma radiation;Materials Science in Semiconductor Processing;2024-08
2. Effects of gamma radiation on the electrical properties of InAs/InGaAs quantum dot-based laser structures grown on GaAs and Si substrates by molecular beam epitaxy;Physical Chemistry Chemical Physics;2024
3. Impact of 1 MeV proton irradiation on InGaAsN solar cells;Semiconductor Science and Technology;2022-04-11
4. Degradation Study of InGaAsN p-i-n Solar Cell Under 1-MeV Electron Irradiation;IEEE Transactions on Nuclear Science;2021-08
5. Investigation of the Effect of Gamma Radiation on the Electrical and Optical Properties of Dilute GaAs <sub>1-x</sub>Bi <sub>x</sub> Grown on Molecular Beam Epitaxy;SSRN Electronic Journal;2021
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3