Substrate bias effects during diamond like carbon film deposition by microwave ECR plasma CVD-Reference-Cited by-同舟云学术

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Substrate bias effects during diamond like carbon film deposition by microwave ECR plasma CVD

Published:2008-01 Issue:1 Volume:8 Page:6-12
ISSN:1567-1739
Container-title:Current Applied Physics
language:en
Short-container-title:Current Applied Physics

Author:

Dey R.M.,Singh S.B.,Biswas A.,Tokas R.B.,Chand N.,Venkateshwaran S.,Bhattacharya D.,Sahoo N.K.,Gosavi S.W.,Kulkarni S.K.,Patil D.S.

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Materials Science

Reference19 articles.

1. Ion‐Beam Deposition of Thin Films of Diamondlike Carbon

2. rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications

3. Properties of diamond-like carbon

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