Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering-Reference-Cited by-同舟云学术

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Bonding structure and etching characteristics of amorphous carbon for a hardmask deposited by DC sputtering

Published:2019-12 Issue: Volume:154 Page:277-284
ISSN:0008-6223
Container-title:Carbon
language:en
Short-container-title:Carbon

Author:

Lee So-Yeon,Jang Kyung-Tae,Jeong Min-Woo,Kim Sungtae,Park Hwanyeol^ORCID,Kim Kuntae,Lee Gun-Do,Kim Miyoung,Joo Young-Chang^ORCID

Funder

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Samsung Electronics’ University R&D program

Publisher

Elsevier BV

Subject

General Chemistry,General Materials Science

Reference41 articles.

1. Amorphous carbon;Robertson;Adv. Phys.,1986

2. Electronic and atomic structure of amorphous carbon;Robertson;Phys. Rev. B,1987

3. Hard amorphous (Diamond-Like) carbons;Robertson;Prog. Solid State Chem.,1991

4. Amorphous carbon at low densities: an ab initio study;Bhattarai;Carbon,2017

5. Electrical conductivity of amorphous carbon and amorphous hydrogenated carbon;Dasgupta;Philos. Mag. B,1991

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