Vapor-quenched AlNi alloy thin films in concentration range 12.5 to 75.4 at .% Ni-Reference-Cited by-同舟云学术

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Vapor-quenched AlNi alloy thin films in concentration range 12.5 to 75.4 at .% Ni

Published:1975-05 Issue:5 Volume:9 Page:543-546
ISSN:0036-9748
Container-title:Scripta Metallurgica
language:en
Short-container-title:Scripta Metallurgica

Author:

Dužević D.

Publisher

Elsevier BV

Subject

General Engineering

Reference6 articles.

1. Aluminium-rich AlNi alloys rapidly quenched from the vapor

2. X-ray spectrometry of Al + Ni powder compacts and alloy thin films

3. Metastable Alloy Films

4. Rentgenostrukturnij analiz melkokristalličeskih i amorfnih tel;Kitajgorodskij,1952

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation of Al–Ni alloy films by alternate sputter deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-07

2. Crystallographic structure of Ni rich NiAl films prepared by co-evaporation;Acta Metallurgica;1983-07

3. Konstitutionelle und strukturelle untersuchungen im aluminiumreichen teil der systeme Ni-Al und Pt-Al;Journal of the Less Common Metals;1982-10

4. Use of Metastable Phase Diagrams in Rapid Solidification;MRS Proceedings;1982

5. Rapidly Quenched Metals;Rapidly Quenched Metals;1980

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