Thin stoichiometric silicon nitride prepared by r.f. reactive sputtering-Reference-Cited by-同舟云学术

Thin stoichiometric silicon nitride prepared by r.f. reactive sputtering

Published:1999-02 Issue:2 Volume:39 Page:317-323
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Qian F,Temmel G,Schnupp R,Ryssel H

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

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5. A silicon ultraviolet detector

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