Ab initio photodynamics of model EUV photoresists
Author:
Funder
Czech Science Foundation
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference88 articles.
1. Advances in patterning materials for 193 nm immersion lithography;Sanders;Chem. Rev.,2010
2. Moore's law: past, present, and future;Schaller;IEEE Spectr.,1997
3. Review on micro- and nanolithography techniques and their applications;Pimpin;Eng. J.,2011
4. EUV sources for lithographic applications;Schriever;Opt. Photon.,2008
5. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond;Mojarad;Nanoscale,2015
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