Optical recording characteristics of tin nitride thin films prepared by an atmospheric pressure halide chemical vapor deposition-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Optical recording characteristics of tin nitride thin films prepared by an atmospheric pressure halide chemical vapor deposition

Published:2003-04 Issue:4 Volume:5 Page:587-589
ISSN:1293-2558
Container-title:Solid State Sciences
language:en
Short-container-title:Solid State Sciences

Author:

Takahashi Naoyuki,Takekawa Masahisa,Takahashi Tadashi,Nakamura Takato,Yoshioka Masayuki,Inami Wataru,Kawata Yoshimasa

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference11 articles.

1. New Vapor Phase Growth Method of FeN Thin Films Using a Chloride Source

2. Preparation of FeN thin films by chemical vapor deposition using a chloride source

3. Growth mechanism of FeN films by means of an atmospheric pressure halide chemical vapor deposition

4. Atmospheric pressure chemical vapor deposition of tin nitride thin films using a halide source

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of post-annealing on structural, optical and electrical properties of tin nitride thin films prepared by atomic layer deposition;Applied Surface Science;2021-02

2. Study of the Surface of Polycrystalline Tin Bombarded with Nitrogen Ions;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2020-01

3. Antibacterial and physicochemical properties of co-sputtered CuSn thin films;Surface and Interface Analysis;2017-11-23

4. Tin nitride thin films fabricated by reactive radio frequency magnetron sputtering at various nitrogen gas ratios;Thin Solid Films;2014-11

5. Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor;Journal of Physics D: Applied Physics;2011-04-14

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3