X-ray wavelength optimization of the laser plasma X-ray lithography source-Reference-Cited by-同舟云学术

X-ray wavelength optimization of the laser plasma X-ray lithography source

Published:1990-01 Issue:2 Volume:10 Page:91-105
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Chaker M.,Boily S.,Lafontaine B.,Kieffer J.C.,Pépin H.,Toubhans I.,Fabbro R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. X-ray conversion efficiency as a function of atomic number for 0.26-μm-laser-irradiated targets;Alaterre;Phys. Rev. A,1986

2. Microlithography using a laser-plasma created X-ray source;Chaker;SPIE923 Electron-beam, X-ray and Ion-Beam Technology: Submicrometer lithographies,1988

3. Laser plasma X-ray sources for microlithography;Chaker;J. Appl. Phys.,1988

4. Properties of a laser-plasma X-ray source for X-ray lithography;Crawford;J. Vac. Sci. Technol.,1987

5. X-ray lithography;Heuberger;J. Vac. Sci. Technol.,1988

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1. Gradual tilting exposure photo and nano lithography technique;Applied Optics;2012-05-25

2. Short-pulse laser - plasma interactions;Plasma Physics and Controlled Fusion;1996-06-01

3. Caractérisation d'une source X créée par laser;Annales de Physique;1994-10

4. Materials For Laser-Plasma X-Ray Source Targets Applicable To Lithography;MRS Proceedings;1993

5. Laser plasma sources for proximity printing or projection x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11