An improved bilayer PMGI(1) lithographic process-Reference-Cited by-同舟云学术

An improved bilayer PMGI(1) lithographic process

Published:1987-12 Issue:1-4 Volume:6 Page:487-494
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Guibert J.C.,Chevalier M.,Paniez P.,Amblard G.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

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3. M.M. O'Toole, E.D. Liu, M.S. Chang, Multilevel resist for photolithography utilising an absorbing dye simulation and experiment, SPIE 81, vol. 275.

4. Materials for multilevel resist schemes

5. J.Ch. Guibert, M. Chevalier, A Contrast Enhanced Reflectionless process, SPIE Europa 87 (to be published).

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