Author:
Turcu Edmond,Davis Gillian,Gower Malcolm,O'Neill Fergus,Lawless Martin
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. X-ray lithography using a KrF laser–plasma source
2. Proc 3rd Topical Meeting on Short Wavelength Coherent Radiation: Generation and Applications, AIP Conf Proc No 147;O'Neill,1986
3. Micronix Corp (USA) have previously fabricated high quality 1 μm thich Si membranes suitable for X-ray masks. S Harell (private communication).
4. Phase conjugation of KrF laser radiation
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