Electron-beam metrology and inspection-Reference-Cited by-同舟云学术

Electron-beam metrology and inspection

Published:1987 Issue:1 Volume:7 Page:41-60
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Brunner M.,Schmid R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference78 articles.

1. E-beam two-coordinate measuring tool for high precision metrology in microlithography;Bruenger;Microcircuit Engineering,1983

2. E-beam metrology of chromium master masks and of masks for X-ray lithography;Bruenger;J. Vac. Sci. Technol. B,1985

3. Surface potential measurements on floating targets with a parallel beam technique;Brunner;J. Vac. Sci. Technol. B,1983

4. Charging effects in low-voltage scanning electron microscope metrology;Brunner;Scanning Electron Microscopy,1986

5. Charging phenomenon in conductor insulator components as displayed by the scanning electron microscope;Campbell;J. Appl. Phys.,1983

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