Thermoelastic deformations of masks for deep X-ray lithography-Reference-Cited by-同舟云学术

Thermoelastic deformations of masks for deep X-ray lithography

Published:1995-02 Issue:1-4 Volume:27 Page:513-516
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Feiertag G.,Schmidt M.,Schmidt A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Three-dimensional microfabrication using synchrotron radiation

2. Front. in Science and Techn., Symp. Aix-en-Provence;Lehr,1994

3. In situ temperature and distribution measurements of x-ray

4. Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation

5. Thermal effects in x-ray masks during synchrotron storage ring irradiation

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