Multilayer resists with variable layer parameters for submicron lithography-Reference-Cited by-同舟云学术

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Multilayer resists with variable layer parameters for submicron lithography

Published:1990-04 Issue:1-4 Volume:11 Page:553-556
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Aristov V.V.,Dmitriyeva V.A.,Kudryashov V.A.,Pfeiffer K.,Lorkowski H.-J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Photoelectron exposure of x-ray resists

2. Investigation of structure profiles in negative resists

3. Submicrometre lift-off line with T-shaped cross-sectional form

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chemically Amplified Resist for Micromachining Using X-Ray Lithography;Microsystems;2002

2. Electron beam lithography using chemically-amplified resist: Resolution and profile control;Microelectronic Engineering;1996-01

3. Polymer dissolution. I. On the dissolution behavior of copolymers of methyl methacrylate and methacrylic acid;Journal of Applied Polymer Science;1994-01-10

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