Author:
Henke W.,Mewes D.,Weiβ M.,Czech G.,Schieβl-Hoyler R.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Modeling projection printing of positive photoresist;Dill;IEEE Trans. on Electron Dev.,1975
2. Surface-etching simulation and applications in IC processing;Neureuther,1976
3. Simulation of lithographic images and resist profiles;Henke;Microelectronic Engineering,1990
4. Assessment of high contrast g- and i-line resists using high numerical aperture exposure tools;Gutmann,1989
5. Development of positive photoresist;Kim;IEEE Trans on Electron Dev.,1984
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14 articles.
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