A model for calculating the thickness profile of TiB2 and Al multilayer coatings produced by planar magnetron sputtering-Reference-Cited by-同舟云学术

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A model for calculating the thickness profile of TiB2 and Al multilayer coatings produced by planar magnetron sputtering

Published:2001-07 Issue: Volume:142-144 Page:934-938
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Silva M.Fátima Vales,Nicholls J.R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference13 articles.

1. Metallic and Ceramic Coatings;Hocking,1989

2. Physical Vapour Deposition, Airco Temescal;Hill,1976

3. Glow Discharge Processes;Chapman,1980

4. Handbook of Deposition Technologies for Films and Coatings;Bunshah,1994

5. Ring etching zones on magnetron sputtering targets;Golan;Thin Solid Films,1997

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