Material interface detection based on secondary electron images for focused ion beam machining-Reference-Cited by-同舟云学术

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Material interface detection based on secondary electron images for focused ion beam machining

Published:2018-01 Issue: Volume:184 Page:37-43
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Joe Hang-Eun,Lee Won-Sup,Jun Martin B. G.,Park No-Cheol,Min Byung-Kwon

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Focused ion beam microscopy and micromachining;Volkert;MRS Bull.,2007

2. Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry;Klingner;Ultramicroscopy,2016

3. Simulation of ion imaging: Sputtering, contrast, noise;Castaldo;Ultramicroscopy,2011

4. Applications of focused ion beam microscopy to materials science specimens;Phaneuf;Micron,1999

5. Origins of material contrast in scanning ion microscope images;Ishitani;J. Electron Microsc.,2002

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