Etching and hydrogen diffusion mechanisms during a hydrogen plasma treatment of silicon thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference11 articles.
1. A. Fontcuberta i Morral, P. Roca i Cabarrocas, to be published
2. Insitumeasurements of changes in the structure and in the excess charge‐carrier kinetics at the silicon surface during hydrogen and helium plasma exposure
3. Role of mobile hydrogen in the amorphous silicon recrystallization
4. Silicon-hydrogen bonding and hydrogen diffusion in amorphous silicon
Cited by 68 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Investigation of anisotropic textured crystalline silicon surface passivation with intrinsic amorphous silicon layers: role of annealing pressure conditions during passivation recovery;Journal of Materials Science: Materials in Electronics;2023-07
2. Detailed review on c-Si/a-Si:H heterojunction solar cells in perspective of experimental and simulation;Microelectronic Engineering;2022-09
3. Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas;Journal of Vacuum Science & Technology A;2022-09
4. Intrinsic layer modification in silicon heterojunctions: Balancing transport and surface passivation;Solar Energy Materials and Solar Cells;2022-05
5. Maintaining superior crystallinity and conductivity in boron-doped nc-Si ultra-thin films by hydrogen plasma treatment;Journal of Physics and Chemistry of Solids;2021-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3