Electronic stopping power threshold of sputtering in yttrium iron garnet

Author:

Meftah A.,Djebara M.,Stoquert J.P.,Studer F.,Toulemonde M.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Sputtering of LiF and other halide crystals in the electronic energy loss regime;The European Physical Journal D;2020-07

2. Electronic sputtering of LiF, CaF 2 , LaF 3 and UF 4 with 197 MeV Au ions. Is the stoichiometry of atom emission preserved?;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-09

3. Study of thickness dependent sputtering in gold thin films by swift heavy ion irradiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-12

4. Phase transformation of ZnMoO4 by localized thermal spike;Journal of Applied Physics;2014-04-28

5. Electronic sputtering of Gd3Ga5O12 and Y3Fe5O12 garnets: Yield, stoichiometry and comparison to track formation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2011-05

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