RIKEN 200 KV high current implanter for metal surface modification-Reference-Cited by-同舟云学术

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RIKEN 200 KV high current implanter for metal surface modification

Published:1985-01 Issue:1-2 Volume:6 Page:51-55
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Iwaki Masaya,Yoshida Kiyota,Sakudo Noriyuki,Satou Susumu

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference6 articles.

1. Production of high-current metal ion beams

2. Microwave ion source for high current metal beams

3. Surface layer characteristics of ion-implanted metals

4. Sputtering observations during binary alloy production by ion implantation

5. Microwave ion source for high‐current implanter

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Use of ion sources for nonsemiconductor surface modification (plenary);Review of Scientific Instruments;2002-02

2. Microwave ion sources for material processing (invited);Review of Scientific Instruments;1998-02

3. Surface hardening of SUS304 by irradiation with a KrF excimer laser in SiH4 gas ambient;Journal of Materials Research;1990-02

4. Improvement of a microwave ion source for surface modification;Materials Science and Engineering: A;1989-08

5. Ion sources for use in ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02

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