Surface and interface analysis by nonresonant multiphoton ionization of sputtered neutrals
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference32 articles.
1. Secondary Ion Mass Spectrometry SIMS V,1986
2. Sputtering of Surfaces by Positive Ion Beams of Low Energy
3. Mass Spectrometric Study of Neutral Particles Sputtered from Cu by 0‐ to 100‐eV Ar Ions
4. Mass spectroscopy of sputtered neutrals and its application for surface analysis
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1. Reactive ion sputter depth profiling of tantalum oxides: A comparative study using ToF-SIMS and laser-SNMS;Surface and Interface Analysis;1995-08
2. The significance of autoionization processes during nonresonant one-color two-photon ionization of neutral silver and copper atoms at λ = 248 nm;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-10
3. A novel four grid ion reflector for saturation of laser multiphoton ionization yields in a time of flight mass spectrometer;International Journal of Mass Spectrometry and Ion Processes;1993-09
4. Photoion detection with a wide dynamic range using a quadrupole mass spectrometer for nonresonant multiphoton ionization of sputtered neutrals;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-09
5. Formation of atomic beams and dynamics of in situ superconducting film growth by pulsed-laser deposition;Thin Solid Films;1992-10
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