Comparative study of 57Fe in CoSi2 after direct ion implantation and after ion implantation of a radioactive parent-Reference-Cited by-同舟云学术

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Comparative study of 57Fe in CoSi2 after direct ion implantation and after ion implantation of a radioactive parent

Published:1990-03 Issue:1-4 Volume:48 Page:461-463
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Vantomme A.,Dézsi I.,Langouche G.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference8 articles.

1. Mössbauer spectroscopy study of the thermal annealing behavior of very low and very high dose Co-implanted Si

2. Dose dependence of Mössbauer spectra of ion-implanted57Co and57Fe in silicon

3. Mössbauer spectroscopy and rutherford backscattering study of Co-Silicide surface layers on Si

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low temperature ion beam mixing of Co/Si systems;Hyperfine Interactions;1992-04

2. Ion implantation;Hyperfine Interactions;1992-04

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