A time-of-flight secondary ion microscope
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference6 articles.
1. Proc 7th Int Conf Secondary Ion Mass Spectrometry (SIMS VII);Schueler,1989
2. Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis
3. B-contamination of Si-surfaces
4. Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF)
5. Effect of SiO2surface chemistry on the oxidation of silicon
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