The effect of re-sputtering on the in situ growth of superconducting YBa2Cu3Ou thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference13 articles.
1. Role of atomic oxygen produced by an electron cyclotron resonance plasma in the oxidation of YBa2Cu3O7−xthin films studied byinsituresistivity measurement
2. Insitugrowth of DyBa2Cu3O7−xthin films by molecular beam epitaxy
3. Role of atomic oxygen in the low‐temperature growth of YBa2Cu3O7−δthin films by laser ablation deposition
4. Energetic particle bombardment of films during magnetron sputtering
5. Synthesis and properties of YBa2Cu3O7 thin films grown in situ by 90° off-axis single magnetron sputtering
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1. A new fabrication method for ZnO:Al thin films using modified DC magnetron sputtering;Journal of the Ceramic Society of Japan;2017
2. Effects of plasma power on the epitaxial growth of (Ba0.48Sr0.52)TiO3 thin film;Journal of Applied Physics;1999-07
3. Effect of a shield on the formation of the superconducting phases in the BiSrCaCuO film deposited by off-axis sputtering;Physica C: Superconductivity;1996-11
4. Resputtering of the superconducting BiSrCaCuO thin films;Physica C: Superconductivity;1995-11
5. Orienteda-axis andc-axis growth of YBa2Cu3Ox RF sputtered on SrTiO3(100) and MgO(100);Physica Status Solidi (a);1994-12-16
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