Thin films of low Z materials in fusion devices

Author:

Waelbroeck F

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Plasma surface engineering in first wall of tokamak;Surface and Coatings Technology;2000-09

2. Ion Plating and Ion Beam Assisted Deposition;Handbook of Physical Vapor Deposition (PVD) Processing;1998

3. The Low-Pressure Gas and Vacuum Processing Environment;Handbook of Physical Vapor Deposition (PVD) Processing;1998

4. Hydrogen retention in plasma-facing materials and its consequences on tokamak operation;Journal of Nuclear Materials;1997-02

5. H2O pumping by sputter discharge with a LaB6 cathode;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-03

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