Apparatus for the controlled deposition of optical film systems-Reference-Cited by-同舟云学术

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Apparatus for the controlled deposition of optical film systems

Published:1959-07 Issue:3-4 Volume:9 Page:171-185
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Steckelmacher W.,Parisot J.M.,Holland L.,Putner T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference28 articles.

1. Ionic Bombardment Cleaning of Glass

2. L. Holland; The Vacuum Deposition of Thin Films, Chapman & Hall Ltd. (a)L. Holland; The Vacuum Deposition of Thin Films, Chapman & Hall Ltd., p. 87

3. The distribution of thin films condensed on surfaces by the vacuum evaporation method

4. Improved Methods for Producing Interference Filters

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4. Historical development and state of the art of nuclear targetry in the United Kingdom and Australia;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1993-09

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