Phenomenological analysis of vacancy mechanism for self-diffusion and tracer diffusion-Reference-Cited by-同舟云学术

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Phenomenological analysis of vacancy mechanism for self-diffusion and tracer diffusion

Published:1984-09 Issue:1 Volume:66 Page:107-114
ISSN:0025-5416
Container-title:Materials Science and Engineering
language:en
Short-container-title:Materials Science and Engineering

Author:

Guy A.G.

Publisher

Elsevier BV

Subject

General Engineering

Reference13 articles.

1. Self-diffusion calculation for f.c.c. metals;Kornblit;Phys. Rev. B,1977

2. Atomic jump processes in self-diffusion;Mehrer;J. Nucl. Mater.,1978

3. Diffusion Kinetics for Atoms in Crystals;Manning,1968

4. Inequality of the flux of atoms and the cojnter flux of vacancies;Guy;Trans. Jpn. Inst. Met.,1978

5. Diffusion in Solids;Shewmon,1963

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Grain structure evolution at sintering of the bulk Bi2Te3 nanomaterial under hot pseudo-isostatic pressure;Journal of Materials Science;2015-12-21

2. Analysis of diffusion in metals based on non-equilibrium thermodynamics;Journal of Materials Science;1986-01

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