Gas recycling and flow control for cost reduction of diamond films deposited by DC arc-jet

Author:

Martorell Ivan A.,Partlow William D.,Young Robert M.,Schreurs Jan J.,Saunders Howard E.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. W.D. Partlow, J. Schreurs, R.M. Young, I. Martorell, S.V. Dighe, G.S. Swartzbeck, J. Burton, Low cost diamond production with large plasma torches. Applied Diamond Conference 1995, International Conference on the Applications of Diamond Film and Related Materials, NIST, Gaithersburg, MD, 21–24 August 1995.

2. Symptomatic behavior of an electric arc with superimposed flow;Wutzke;AIAA Journal,1968

3. Experimental anode heat-transfer studies in a coaxial arc configuration;Shih;AIAA Journal,1968

4. A new method of diamond CVD with a closed gas circuit;Fryda;Diamond and Related Materials,1994

5. F.X. Lu, G.F. Zhong, Y.L. Fu, J.J. Wang, W.Z. Tang, G.H. Li,T.L. Lo, Y.G. Zhang, J.M. Zang, C.H. Pan, C.X. Tang, 100kW DC Adrc plasma jet CVD system for low cost large area diamond film deposition. In: Proceedings of the 1st International Diamond Symposium, 5–7 November 1996, Seoul, South Korea, pp. 115–120.

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