Tailoring Ge membrane adhesion strength: Impact of growth parameters and porous layer thickness-Reference-Cited by-同舟云学术

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Tailoring Ge membrane adhesion strength: Impact of growth parameters and porous layer thickness

Published:2024-10 Issue: Volume:216 Page:114292
ISSN:1044-5803
Container-title:Materials Characterization
language:en
Short-container-title:Materials Characterization

Author:

Paupy Nicolas,Ayari Ahmed,Ilahi Bouraoui,Hanuš Tadeáš,Cho Jinyoun,Dessein Kristof,Machon Denis,Arès Richard,Boucherif Abderraouf

Publisher

Elsevier BV

Reference44 articles.

1. High-speed near infrared optical receivers based on Ge waveguide photodetectors integrated in a CMOS process;Masini;Adv. Optical Technol.,2008

2. Flexible photodetectors on plastic substrates by use of printing transferred single-crystal germanium membranes;Yuan;Appl. Phys. Lett.,2009

3. Germanium-based integrated photonics from near- to mid-infrared applications;Marris-Morini;Nanophotonics,2018

4. Electrical properties of ultra-thin body (111) Ge-on-insulator n-channel MOSFETs fabricated by smart-cut process;Lim;IEEE J. Electron Devices Soc.,2021

5. Advancements in semiconductor core optical fiber;Ballato;Opt. Fiber Technol.,2010

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