Calibration of straight total reflection X-ray fluorescence spectrometry — results of a European Round Robin test-Reference-Cited by-同舟云学术

Calibration of straight total reflection X-ray fluorescence spectrometry — results of a European Round Robin test

Published:2001-11 Issue:11 Volume:56 Page:2283-2292
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Rink I.,Rostam-Khani P.,Knoth J.,Schwenke H.,de Gendt S.,Wortelboer R.

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference13 articles.

1. R.S. Hockett, Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectrometry, Am. Soc. Test. Mater., Stand. F1526–F1594.

2. Surface chemical analysis — measurement of surface elemental contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy (TXRF), Final Working Draft, ISO 14706 (1997).

3. Test method for the determination of residual surface contamination on silicon wafers by means of total reflection X-ray fluorescence spectroscopy (TXRF), SEMI stand., M33-0998.

4. P. Mertens, S. de Gendt, K. Kenis, Calibration accuracy of different Atomika TXRF 8010 instruments, IMEC-internal report, July 1996.

5. S. Degendt, TXRF Round Robin and VPD Round Robin test, Lecture at 7th TXRF conference, Austin, Texas, 1998.

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