A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry using synchrotron radiation-Reference-Cited by-同舟云学术

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A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry using synchrotron radiation

Published:2003-12 Issue:12 Volume:58 Page:2039-2048
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Schwenke Heinrich,Beaven Peter A,Knoth Joachim,Jantzen Eckard

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference5 articles.

1. Photoelectron bremsstrahlung spectrum in synchrotron radiation excited total reflection x-ray fluorescence analysis of silicon wafers

2. Wavelength-Dispersive Total-Reflection X-ray Fluorescence with an Efficient Johansson Spectrometer and an Undulator X-ray Source: Detection of 10-16 g-Level Trace Metals

3. A formula for the background in TXRF as a function of the incidence angle and substrate material

4. Recent advances and perspectives in synchrotron radiation TXRF

5. Calibration of total-reflection X-ray fluorescence using a nickel bulk sample

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Instrumentation for TXRF and GI-XRF;Total-Reflection X-Ray Fluorescence Analysis and Related Methods;2014-12-19

2. A novel gas-filled detector for pulsed X-ray sources;Spectrochimica Acta Part B: Atomic Spectroscopy;2004-08

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