The accelerating effect of high magnetic field annealing on the interdiffusion behavior of Co/Ni films-Reference-Cited by-同舟云学术

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The accelerating effect of high magnetic field annealing on the interdiffusion behavior of Co/Ni films

Published:2013-09 Issue: Volume:106 Page:190-192
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Zhao Yue,Li Donggang,Wang Kai,Wang Qiang,Franczak Agnieszka,Levesque Alexandra,Chopart Jean-Paul,He Jicheng

Funder

National Natural Science Foundation of China

Agence Nationale de la Recherche France

MATERALIA

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference18 articles.

1. Interdiffusion phase formation, and stress development in Cu–Pd thin-film diffusion couples: interface thermodynamics and mechanisms;Chakraborty;J Appl Phys,2008

2. Physics at surface;Zangwil,1989

3. Diffusion phenomena in thin film and microelectronic materials;Gupta,1988

4. Formation of aligned two-phase microstructure in Fe-0.25 mass%C alloy under gradient high magnetic fields;Wang;Mater Lett,2008

5. Evolution of coating layers during pack alumetizing process induced by high magnetic fields;Li;Mater Lett,2009

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