Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method-Reference-Cited by-同舟云学术

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Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method

Published:2009-10 Issue:26 Volume:63 Page:2181-2184
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Bae Joon Woo,Lim Jae-Won,Mimura Kouji,Uchikoshi Masahito,Wada Mitsuhiro,Ikeda Makoto,Isshiki Minoru

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference12 articles.

1. Epitaxy, strain and morphology of low Ar pressure sputtered Pt thin films

2. Electrical resistivity of vacuum-arc-deposited platinum thin films

3. Anemometer with hot platinum thin film

4. Fabrication of High Quality Ni1-xPtxFilms for Use as Materials in High-Sensitivity Temperature Sensor

5. Surfactant-mediated growth of ultrathin Ge and Si films and their interfaces: Interference-enhanced Raman study

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Progress in Optimization of Physical Vapor Deposition of Thin Films;Advances in Civil and Industrial Engineering;2021

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