Arsenic diffusion in Si and strained SixGe1−x alloys at 1000 °C
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference9 articles.
1. Diffusion of Sb in Strained and Relaxed Si and SiGe
2. Boron and phosphorus diffusion in strained and relaxed Si and SiGe
3. Germanium-concentration dependence of arsenic diffusion in silicon germanium alloys
4. Concentration Profiles of Diffused Dopants in Silicon;Fair,1981
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2. Artificial Neural Network Based Process Model for Arsenic Diffusion in Si1-xGex Alloys;Advanced Materials Research;2011-11
3. Finite Cylinders of Si1 −xGexAlloy Under the Double-Punch Test and Effect on Three Valence-Bands;Mechanics of Advanced Materials and Structures;2009-06-19
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5. AtmosphericIn situArsenic-Doped SiGe Selective Epitaxial Growth for Raised-Extension N-type Metal–Oxide–Semiconductor Field-Effect Transistor;Japanese Journal of Applied Physics;2007-04-24
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