FTIR and electrical characterization of a-Si:H layers deposited by PECVD at different boron ratios
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
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1. Plasma chemistry basic processes and PECVD;Flamm,1997
2. Studying low-pressure chemical vapor depositiona-Si:B alloys by optical spectroscopy
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