Pulsed laser deposition of aluminum nitride and gallium nitride thin films

Author:

Sudhir G.S,Fujii H,Wong W.S,Kisielowski C,Newman N,Dieker C,Liliental-Weber Z,Rubin M.D,Weber E.R

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference13 articles.

1. Landolt-Bornstein, Numerical Data and Functional Relationships in Science and Technology, Vol. III/17a and 17d, Springer, Berlin, 1982 and 1984.

2. J.H. Edgar (Ed.), Properties of Group III Nitrides, London: INSPEC, Institution of Electrical Engineers, EMIS datareviews series, 11, c1994.

3. Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer

4. GaN Growth Using GaN Buffer Layer

5. GaN, AlN, and InN: A review

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