Dry etch chemistries for TiO2 thin films-Reference-Cited by-同舟云学术

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Dry etch chemistries for TiO2 thin films

Published:2001-12 Issue:1-2 Volume:185 Page:27-33
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Norasetthekul S.,Park P.Y.,Baik K.H.,Lee K.P.,Shin J.H.,Jeong B.S.,Shishodia V.,Lambers E.S.,Norton D.P.,Pearton S.J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference23 articles.

1. The effect of annealing on the structure and dielectric properties of BaxSr1−xTiO3 ferroelectric thin films

2. Electrochemical Photolysis of Water at a Semiconductor Electrode

3. High mobilityn‐type charge carriers in large single crystals of anatase (TiO2)

4. High-k cobalt–titanium oxide dielectrics formed by oxidation of sputtered Co/Ti or Ti/Co films

5. Charge trapping and degradation in high-permittivity TiO2 dielectric films

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