Microstructural analysis of hard amorphous carbon films deposited with high-energy ion beams-Reference-Cited by-同舟云学术

Microstructural analysis of hard amorphous carbon films deposited with high-energy ion beams

Published:1999-08 Issue:1-4 Volume:150 Page:202-210
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Brusa R.S,Somoza A,Huck H,Tiengo N,Karwasz G.P,Zecca A,Reinoso M,Halac E.B

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference26 articles.

1. Hydrogen-free amorphous carbon films: correlation between growth conditions and properties

2. Y. Lifshitz, in: A. Paoletti, A. Tucciarone (Eds.), Tetrahedral Amorphous Carbon (ta-C), Proc. Int. School of Physics `Enrico Fermi', Course CXXXV (IOS Press, Amsterdam, 1997) p. 209.

3. Systematic variation of the Raman spectra of DLC films as a function of sp2:sp3 composition

4. Characterization of hard amorphous carbon films deposited with high-energy ion beams

5. Structure and thermal behavior of N containing a-C films obtained by high energy ion beam deposition

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