Growth process of twinned epitaxial layers on Si(111)-B and their thermal stability
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference24 articles.
1. K. Akimoto, J. Mizuki, I. Hirosawa, T. Tatsumi, H. Hirayama, N. Aizaki, J. Matsui, Extended Abstracts of the 19th Conference on Solid State Devices and Materials, Business Center for Academic Societies, Tokyo, 1987, p. 463.
2. Stability of boron‐ and gallium‐induced surface structures on Si(111) during deposition and epitaxial growth of silicon
3. Structure of (√3×√3) R 30°‐B at the Si interface studied by grazing incidence x‐ray diffraction
4. Influence of surface reconstruction on the orientation of homoepitaxial silicon films
5. Growth Temperature Dependence of Boron Surface Segregation and Electrical Properties of Boron Delta-Doped Structures Grown by Si Molecular Beam Epitaxy
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1. Hydrogen chemisorption on Si(111)√3×√3R30∘-B passivated surface studied by thermal desorption and scanning tunneling microscopy;Surface Science;2011-08
2. An STM study of Ge heteroepitaxial growth on Si(111)√3×√3-B surfaces;Surface Science;2008-11
3. Growth of Twinned Epitaxial Layers on Si(111)$\sqrt{3}\times\sqrt{3}$-B Studied by Low-Energy Electron Microscopy;Japanese Journal of Applied Physics;2005-01-11
4. Growth of Si twinning superlattice;Materials Science and Engineering: B;2001-12
5. Si Twinning Superlattice;Materia Japan;2001
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