Substrate bias effects during in situ growth of Y1Ba2Cu3O7−δthin films by RF magnetron sputtering-Reference-Cited by-同舟云学术

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Substrate bias effects during in situ growth of Y1Ba2Cu3O7−δthin films by RF magnetron sputtering

Published:1991-04 Issue:3-4 Volume:175 Page:310-314
ISSN:0921-4534
Container-title:Physica C: Superconductivity
language:en
Short-container-title:Physica C: Superconductivity

Author:

Pinto R.,Poothra J.I.,Pai S.P.,Gupta L.C.,Vijayaraghavan R.,Kumar Dhananjay,Sharon M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Energy Engineering and Power Technology,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Thin Film Processing and Characterization of High Temperature Superconductors;Rossnagal,1988

2. Sputter Synthesis of Ba2YCu3OyAs-Deposited Superconducting Thin Films from Stoichiometric Target -- A Mechanism of Compositional Deviation and Its Control

3. Film growth of high transition temperature superconductors

4. In-situ YBa2Cu3O7−x thin films epitaxially grown by single target DC sputtering

5. Effect of Substrate Temperature on the Crystalline State of Ba2ErCu3O7-xSuperconducting Thin Films by rf Magnetron Sputtering

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pulsed laser deposition and characterization of high-Tc YBa2Cu3O7 − x superconducting thin films;Materials Science and Engineering: R: Reports;1998-04

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