Surface electromigration of metal atoms on Si(111) surfaces studied by UHV reflection electron microscopy-Reference-Cited by-同舟云学术

Surface electromigration of metal atoms on Si(111) surfaces studied by UHV reflection electron microscopy

Published:1989-05 Issue:1-4 Volume:29 Page:161-167
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Yamanaka Akira,Yagi Katsumichi,Yasunaga Hitoshi

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Diffusion in Solids (Recent Developments);Huntington,1975

2. Thin Films — Interdiffusion and Reactions;d'Heurle,1978

3. Electromigration of In Ultrathin Film on Si(111)

4. H. Yasunaga, S. Sakomura, S. Kobayashi, N. Okuyama and N. Natori, in: Extended Abstracts 18th (1986 Intern.) Conf. on Solid State Devices and Materials, Tokyo, 1986, p. 407.

5. Field-induced surface transport of indium adatoms on Si(111) surfaces

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