Observation of surface diffusion by biassed secondary electron imaging: The case of Ag/W(110)-Reference-Cited by-同舟云学术

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Observation of surface diffusion by biassed secondary electron imaging: The case of Ag/W(110)

Published:1985-01 Issue:1-4 Volume:18 Page:439-444
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Jones G.W.,Venables J.A.

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. UHV-SEM studies of surface processes: Recent progress

2. Digital data acquisition, display and analysis of signals from surfaces

3. Electron Microscopy and Analysis 1983;Fathers,1983

4. UHV-SEM study of the nucleation and growth of Ag/W(110)

5. Nucleation, growth and the intermediate layer in Ag/Si(100) and Ag/Si(111)

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1. Low-stress design of bonding structure and its thermal shock performance (− 50 to 250 °C) in SiC/DBC power die-attached modules;Journal of Materials Science: Materials in Electronics;2018-06-29

2. Scanning Electron and Auger Microscopy of Surfaces and Small Particles;Encyclopedia of Surface and Colloid Science, Third Edition;2015-12-04

3. Imaging diffusion fields on a surface with multiple reconstructions: Ag/Si(111);New Journal of Physics;2010-10-13

4. Real-Time Observation of Reactive Spreading of Gold on Silicon;Physical Review Letters;2009-12-18

5. High spatial resolution studies of surfaces and small particles using electron beam techniques;Journal of Electron Spectroscopy and Related Phenomena;2005-05

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