1. Reimer, L., “Electron Optics and Instrumentation,” Ch. 2, Image Formation on Low-Voltage Scanning Electron Microscopy, Vol. TT12 SPIE Optical Engineering Press, Bellingham
2. Goldstein, J.I., Newbury, D.E., Eichlin, P., Joy, D.C., Romig, A.D., Lyman, C.E., Fiori, C., and Lifshin, E., Scanning Electron Microscopy and X-ray Microanalysis, 2nd Ed., Plenum Press (New York) Ch. 2, “Electron Optics”
3. Goldstein, J.I., Newbury, D.E., Eichlin, P., Joy, D.C., Romig, A.D., Lyman, C.E., Fiori, C., and Lifshin, E., Scanning Electron Microscopy and X-ray Microanalysis, 2nd Ed., Plenum Press (New York) Ch. 2, “Electron Optics, ” p. 34 for details about the different electron sources
4. Metrology Algorithms for Machine Matching in Different CD-SEM Configurations;Reilly;Integrated Circuit Metrology, Inspection, and Process Control VI, SPIE,1992
5. Rogers, S.R., “New CD-SEM Technology for 0.25 μm Production,” SPIE, 2439:353-362