The role of plasmatron/magnetron systems in physical vapor deposition techniques

Author:

Schiller S.,Heisig U.,Goedicke K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference51 articles.

1. Fundamentals of ion plating;Mattox;J. Vac. Sci. Technol.,1973

2. Ionenplattieren—ein neues Verfahren der Vakuumbeschichtung;Schiller;Vak. Tech.,1976

3. Ionenplattieren—ein neues Verfahren der Vakuumbeschichtung;Schiller;Vak. Tech.,1976

4. Alternating ion plating—a way to high rate ion vapor deposition;Schiller;J. Vac. Sci. Technol.,1975

5. Activated reactive evaporation process for high rate deposition of compounds;Bunshah;J. Vac. Sci. Technol.,1972

Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. The Effect of TiN, TiAlN, TiCN Thin Films Obtained by Reactive Magnetron Sputtering Method on the Wear Behavior of Ti6Al4V Alloy: A Comparative Study;Coatings;2022-08-25

2. The Effect of Coatings on the Wear Behavior of Ti6Al4V Alloy Used in Biomedical Applications;IOP Conference Series: Materials Science and Engineering;2018-01

3. Plasma-based physical vapor deposition surface engineering processes;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-09

4. Equipment, technology and protective coatings produced by ion bombardment deposition;Surface and Coatings Technology;1997-05

5. Vacuum arc deposition of Mo films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3